The POU3500 procedure delivers dynamic temperature Charge of the method chamber cathode / electrode / anode and can be synchronized with any etch procedure.

30% of its peak electrical power use, supplying our prospects major reduction in functioning costs and enhanced trustworthiness.

the knowledge down below is classified by semiconductor approach and tool company. Each and every table includes an Applications Matrix that exhibits qulified and industrial procedures.

We embrace personal accountability and acknowledge obligation for prudent possibility getting. We motivate individual values, which guidebook us to consistently satisfy the commitments we make and we endeavor to take care of Those people with whom we interact with regard as we desire to be dealt with ourselves.

LAUDA-Noah will, for a customer's retrofit analysis, watch and regulate its fluid temperature control profiles to match an current TCUs' as a way to ensure a sleek process integration by way of DAQ.

we have been guided inside our belief that prosperity Within this aggressive marketplace stems from delivering consumers with highly engineered new solutions and earth class customer care.

All static TCUs involve excess cooling & heating capacities due to their quite big method fluid reservoirs. the method fuid reservoir on LAUDA-Noah's dynamic temperature Manage system is fewer than one gallon.

With our device strategically mounted approximately six toes within the chamber, we achieve a way more exact looking through in the chuck temperature. This tactic ensures dependable temperature through the manufacturing great deal, bringing about improved wafer-to-wafer CD uniformity.

Large Footprint: Static models occupy substantial Place in the fabrication Instrument location, decreasing its performance.

LAUDA-Noah is meeting these new troubles and has here included energy preserving technological know-how in techniques that happen to be pleasant to your surroundings and also have a low price to operate.

The data set Here's from a 200mm quantity generation wafer fab and Evidently illustrates the good thing about the LAUDA-Noah POU program.

a lot more than ever, shrinking gadget geometries, demanding new procedures and a extremely competitive ecosystem call for temperature Command devices that Merge rapid and correct temperature Management with an emphasis on lessened running costs and enhanced dependability.

verified; TEs' represent just one Portion of a chiller's structure. The switching & Regulate approaches employed by a chiller will effect the TEs' reliability.

(consequently, putting in a static unit beside chamber will never enable it to supply dynamic temperature Command)

We need a lot less cooling/heating capacity for the same application as being a static TCU as a result of our smaller reservoir volume.